Initiated Chemical Vapor Deposition: A Versatile Tool for Various Device Applications

Seung Jung Yu, Kwanyong Pak, Moo Jin Kwak, Munkyu Joo, Bong Jun Kim, Myung Seok Oh, Jieung Baek, Hongkeun Park, Goro Choi, Do Heung Kim, Junhwan Choi, Yunho Choi, Jihye Shin, Heeyeon Moon, Eunjung Lee, Sung Gap Im

Research output: Contribution to journalReview articlepeer-review

96 Scopus citations

Abstract

Advances in device technology have been accompanied by the development of new types of materials and device fabrication methods. Considering device design, initiated chemical vapor deposition (iCVD) inspires innovation as a platform technology that extends the application range of a material or device. iCVD serves as a versatile tool for surface modification using functional thin film. The building of polymeric thin films from vapor phase monomers is highly desirable for the surface modification of thermally sensitive substrates. The precise control of thin film thicknesses can be achieved using iCVD, creating a conformal coating on nano-, and micro-structured substrates such as membranes and microfluidics. iCVD allows for the deposition of polymer thin films of high chemical functionality, and thus, substrate surfaces can be functionalized directly from the iCVD polymer film or can selectively gain functionality through chemical reactions between functional groups on the substrate and other reactive molecules. These beneficial aspects of iCVD can spur breakthroughs in device fabrication based on the deposition of robust and functional polymer thin films. This review describes significant implications of and recent progress made in iCVD-based technologies in three fields: electronic devices, surface engineering, and biomedical applications.

Original languageEnglish
Article number1700622
JournalAdvanced Engineering Materials
Volume20
Issue number3
DOIs
StatePublished - Mar 2018

Bibliographical note

Publisher Copyright:
© 2017 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim

Keywords

  • device fabrication
  • functional thin film
  • initiated chemical vapor deposition (iCVD)
  • polymer thin film
  • surface engineering

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