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How tunneling currents reduce plasma-induced charging
Gyeong S. Hwang
, Konstantinos P. Giapis
Department of Chemical Engineering & Materials Science
Research output
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Contribution to journal
›
Article
›
peer-review
10
Scopus citations
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Engineering
Tunnel Construction
100%
Experimental Result
50%
Gate Oxide
50%
Semiconductor Manufacturing
50%
High Aspect Ratio
50%
Material Science
Oxide Compound
100%
Plasma Etching
33%