@article{c0a2c80a554b4bbeb30323862dc3b5ec,
title = "Growth of ultrathin films of amorphous ruthenium-phosphorus alloys using a single source CVD precursor",
abstract = "Thin films (∼30 nm) of amorphous RuP alloys (P ∼ 15-20%) can be grown by CVD from the single source precursor cis-H2Ru(PMe3)4 at 250-300 °C and 200 mTorr pressure on native SiO2.",
author = "Jinhong Shin and Abdul Waheed and Kyriacos Agapiou and Winkenwerder, {Wyatt A.} and Kim, {Hyun Wu} and Jones, {Richard A.} and Hwang, {Gyeong S.} and Ekerdt, {John G.}",
year = "2006",
month = dec,
day = "27",
doi = "10.1021/ja0673938",
language = "English",
volume = "128",
pages = "16510--16511",
journal = "Journal of the American Chemical Society",
issn = "0002-7863",
publisher = "American Chemical Society",
number = "51",
}