Gas-phase etching mechanism of silicon oxide by a mixture of hydrogen fluoride and ammonium fluoride: A density functional theory study
Romel Hidayat, Khabib Khumaini, Hye Lee Kim, Tanzia Chowdhury, Tirta Rona Mayangsari, Seongjae Cho, Byungchul Cho, Sangjoon Park, Jongwan Jung, Won Jun Lee
Research output: Contribution to journal › Article › peer-review
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