GaN junctionless trigate field-effect transistor with deep-submicron gate length: Characterization and modeling in RF regime

  • Ki Sik Im
  • , Jae Hwa Seo
  • , Young Jun Yoon
  • , Young In Jang
  • , Jin Su Kim
  • , Seongjae Cho
  • , Jae Hoon Lee
  • , Sorin Cristoloveanu
  • , Jung Hee Lee
  • , In Man Kang

Research output: Contribution to journalArticlepeer-review

10 Scopus citations

Abstract

Radio-frequency (RF) performances of a gallium nitride (GaN)-based junctionless (JL) trigate field-effect transistor (TGFET), or fin-shaped FET (FinFET), are demonstrated along with RF modeling for the first time. The fabricated GaN JL TGFET had a gate length of 350 nm and had no AlGaN/GaN heterojunction on which conventional high-mobility electron transistors (HEMTs) had been based to have a fully junctionless channel. The device with five fin channels exhibits a maximum drain current of 403 mA/mm and maximum transconductance of 123.6 mS/mm. The maximum cutoff frequency (fT) and maximum oscillation frequency (fmax) are 2.45 and 9.75 GHz, respectively. In order to confirm its potential for high-frequency applications, small-signal modeling has been carried out up to a frequency above the maximum fT.

Original languageEnglish
Article number118001
JournalJapanese Journal of Applied Physics
Volume53
Issue number11
DOIs
StatePublished - 1 Nov 2014

Bibliographical note

Publisher Copyright:
© 2014 The Japan Society of Applied Physics.

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