First-principles mechanistic study of the initial growth of SRO by atomic layer deposition on TiO₂-terminated SrTiO₃ (001)

Engineering

• Atomic Layer Deposition 100%
• Thin Films 40%
• Deposition Process 40%
• Monolayers 40%
• Dielectrics 20%
• Deposition Temperature 20%
• Growth Behavior 20%
• Semiconductor Device 20%
• Energetics 20%
• Film Property 20%
• Terminated Surface 20%
• High Dielectric Constant 20%
• Oxidizer 20%
• Adsorption Energy 20%
• Deep Understanding 20%

Material Science

• Titanium Dioxide 100%
• Monolayers 50%
• Thin Films 50%
• Density 25%
• Permittivity 25%
• Film 25%
• Surface Diffusion 25%
• Semiconductor Device 25%
• Oxide Compound 25%
• Dielectric Material 25%