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Fabrication of polarization-dependent reflective metamaterial by focused ion beam milling

  • J. Kim
  • , Y. U. Lee
  • , Boyoung Kang
  • , J. H. Woo
  • , E. Y. Choi
  • , E. S. Kim
  • , M. Gwon
  • , D. W. Kim
  • , J. W. Wu

Research output: Contribution to journalArticlepeer-review

20 Scopus citations

Abstract

By focused ion beam milling, we fabricated near-IR reflective metamaterials consisting of nano-aperture arrays. Optimum parameters of ion beam current and accelerating voltage in the fabrication process are obtained. Nano-apertures constituting reflective metamaterial are successfully milled, and possess a reflective resonance in the near-IR spectral range. With a double-split-ring resonator structure for the nano-aperture, the intensity reflection at resonance is rendered polarization dependent. It is found that the point group symmetry of the nano-aperture array determines the amount of anisotropy in the intensity reflection. Finite-difference time-domain simulation was adopted to identify details of nano-aperture metastructures transferred from nano-aperture patterns by the focused ion beam milling.

Original languageEnglish
Article number015306
JournalNanotechnology
Volume24
Issue number1
DOIs
StatePublished - 11 Jan 2013

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