Fabrication of metallized nanoporous films from the self-assembly of a block copolymer and homopolymer mixture

Xue Li; Shuying Zhao; Shuxiang Zhang; Dong Ha Kim; Wolfgang Knoll

doi:10.1021/la7002589

Fabrication of metallized nanoporous films from the self-assembly of a block copolymer and homopolymer mixture

Xue Li, Shuying Zhao, Shuxiang Zhang, Dong Ha Kim, Wolfgang Knoll

Department of Chemistry & Nanoscience

Research output: Contribution to journal › Article › peer-review

26 Scopus citations

Abstract

Inorganic compound HAuCl₄, which can form a complex with pyridine, is introduced into a poly(styrene-block-2-vinylpyridine) (PS-b-P2VP) block copolymer/poly(methyl methacrylate) (PMMA) homopolymer mixture. The orientation of the cylindrical microdomains formed by the P2VP block, PMMA, and HAuCl₄ normal to the substrate surface can be generated via cooperative self-assembly of the mixture. Selective removal of the homopolymer can lead to porous nanostructures containing metal components in P2VP domains, which have a novel photoluminescence property.

Original language	English
Pages (from-to)	6883-6888
Number of pages	6
Journal	Langmuir
Volume	23
Issue number	13
DOIs	https://doi.org/10.1021/la7002589
State	Published - 19 Jun 2007

Access to Document

10.1021/la7002589

Cite this

@article{09aaa2ccad474135bb2e9e11587ee71e,

title = "Fabrication of metallized nanoporous films from the self-assembly of a block copolymer and homopolymer mixture",

abstract = "Inorganic compound HAuCl4, which can form a complex with pyridine, is introduced into a poly(styrene-block-2-vinylpyridine) (PS-b-P2VP) block copolymer/poly(methyl methacrylate) (PMMA) homopolymer mixture. The orientation of the cylindrical microdomains formed by the P2VP block, PMMA, and HAuCl4 normal to the substrate surface can be generated via cooperative self-assembly of the mixture. Selective removal of the homopolymer can lead to porous nanostructures containing metal components in P2VP domains, which have a novel photoluminescence property.",

author = "Xue Li and Shuying Zhao and Shuxiang Zhang and Kim, {Dong Ha} and Wolfgang Knoll",

year = "2007",

month = jun,

day = "19",

doi = "10.1021/la7002589",

language = "English",

volume = "23",

pages = "6883--6888",

journal = "Langmuir",

issn = "0743-7463",

publisher = "American Chemical Society",

number = "13",

}

TY - JOUR

T1 - Fabrication of metallized nanoporous films from the self-assembly of a block copolymer and homopolymer mixture

AU - Li, Xue

AU - Zhao, Shuying

AU - Zhang, Shuxiang

AU - Kim, Dong Ha

AU - Knoll, Wolfgang

PY - 2007/6/19

Y1 - 2007/6/19

N2 - Inorganic compound HAuCl4, which can form a complex with pyridine, is introduced into a poly(styrene-block-2-vinylpyridine) (PS-b-P2VP) block copolymer/poly(methyl methacrylate) (PMMA) homopolymer mixture. The orientation of the cylindrical microdomains formed by the P2VP block, PMMA, and HAuCl4 normal to the substrate surface can be generated via cooperative self-assembly of the mixture. Selective removal of the homopolymer can lead to porous nanostructures containing metal components in P2VP domains, which have a novel photoluminescence property.

AB - Inorganic compound HAuCl4, which can form a complex with pyridine, is introduced into a poly(styrene-block-2-vinylpyridine) (PS-b-P2VP) block copolymer/poly(methyl methacrylate) (PMMA) homopolymer mixture. The orientation of the cylindrical microdomains formed by the P2VP block, PMMA, and HAuCl4 normal to the substrate surface can be generated via cooperative self-assembly of the mixture. Selective removal of the homopolymer can lead to porous nanostructures containing metal components in P2VP domains, which have a novel photoluminescence property.

UR - http://www.scopus.com/inward/record.url?scp=34547306746&partnerID=8YFLogxK

U2 - 10.1021/la7002589

DO - 10.1021/la7002589

M3 - Article

C2 - 17530789

AN - SCOPUS:34547306746

SN - 0743-7463

VL - 23

SP - 6883

EP - 6888

JO - Langmuir

JF - Langmuir

IS - 13

ER -

Fabrication of metallized nanoporous films from the self-assembly of a block copolymer and homopolymer mixture

Abstract

Access to Document

Fingerprint

Cite this