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Extreme-Pressure Imprint Lithography for Heat and Ultraviolet-Free Direct Patterning of Rigid Nanoscale Features
Woon Ik Park, Tae Wan Park, Young Joong Choi, Sangryun Lee, Seunghwa Ryu, Xiaogan Liang, Yeon Sik Jung
Research output: Contribution to journal › Article › peer-review
8
Scopus
citations