Evolution of local work function in epitaxial VO 2 thin films spanning the metal-insulator transition

Ahrum Sohn, Haeri Kim, Dong Wook Kim, Changhyun Ko, Shriram Ramanathan, Jonghyurk Park, Giwan Seo, Bong Jun Kim, Jun Hwan Shin, Hyun Tak Kim

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28 Scopus citations

Abstract

Transport and Kelvin probe force microscopy measurements were simultaneously conducted on epitaxial VO 2 thin films. The samples work function abruptly dropped from 4.88 eV to 4.70 eV during heating from 333 K to 353 K, suggesting a significant change in its electronic band structure spanning the metal insulator transition. The work function showed nearly no statistical deviation across the films surface during the transition, likely due to band bending at the boundaries of the small domains. Resistance profiles confirmed that the local work function corresponded closely to the resistance of the corresponding area.

Original languageEnglish
Article number191605
JournalApplied Physics Letters
Volume101
Issue number19
DOIs
StatePublished - 5 Nov 2012

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