Energy band engineered unified-RAM (URAM) for multi-functioning 1T-DRAM and NVM

  • Jin Woo Han
  • , Seong Wan Ryu
  • , Sungho Kim
  • , Chung Jin Kim
  • , Jae Hyuk Ahn
  • , Sung Jin Choi
  • , Kyu Jin Choi
  • , Byung Jin Cho
  • , Jin Soo Kim
  • , Kwang Hee Kim
  • , Gi Sung Lee
  • , Jae Sub Oh
  • , Myong Ho Song
  • , Yun Chang Park
  • , Jeoung Woo Kim
  • , Yang Kyu Choi

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

17 Scopus citations

Abstract

A novel fusion memory is proposed as a new paradigm of silicon based memory technology. An O/N/O gate dielectric and a floating body are combined with a FinFET, and the non-volatile memory (NVM) and high speed capacitorless 1T-DRAM are performed in a single transistor. A nitride trap layer is used as an electron storage node for NVM, and hetero-epitaxially grown Si/Si 1-xGex energy band engineered bulk substrates allow excess hole storage for 1T-DRAM. Highly reliable 1T-DRAM and NVM are demonstrated.

Original languageEnglish
Title of host publication2008 IEEE International Electron Devices Meeting, IEDM 2008
DOIs
StatePublished - 2008
Event2008 IEEE International Electron Devices Meeting, IEDM 2008 - San Francisco, CA, United States
Duration: 15 Dec 200817 Dec 2008

Publication series

NameTechnical Digest - International Electron Devices Meeting, IEDM
ISSN (Print)0163-1918

Conference

Conference2008 IEEE International Electron Devices Meeting, IEDM 2008
Country/TerritoryUnited States
CitySan Francisco, CA
Period15/12/0817/12/08

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