Abstract
Films of aligned multi-walled carbon nanotubes (MWNT) are produced by two different methods, thermal chemical vapour deposition (thermal CVD) and plasma chemical vapour deposition (plasma CVD), on silicon substrates. Electron field emission measurements on these films show that the thermal CVD produced films have excellent emission properties, while the plasma CVD films seem to give a lower electron emission with lower threshold and turn-on fields on the initial voltage scan. The electron emission for some of the films is accompanied by light emission from the carbon nanotubes at high emission current densities. The light emission is a result of strong ohmic heating and can be explained in terms of the one dimensional heat equation. This heating effect in the nanotube film is more important for the thermal CVD films than for the plasma films and can be qualitatively explained by considering the nanotube morphology in each case.
| Original language | English |
|---|---|
| Pages (from-to) | 1165-1168 |
| Number of pages | 4 |
| Journal | Carbon |
| Volume | 42 |
| Issue number | 5-6 |
| DOIs | |
| State | Published - 2004 |
| Event | European Materials Research Society 2003 - Strasbourg, France Duration: 10 Jun 2003 → 13 Jun 2003 |
Bibliographical note
Funding Information:This work was financially supported by the Swedish Foundation for Strategic Research SSF within the CARAMEL Consortium and the Swedish Research Council (Vetenskapsrådet).