Electromagnetic micromirror array with single-crystal silicon mirror plate and aluminum spring

Chang Hyeon Ji; Yong Kweon Kim

doi:10.1109/JLT.2003.809549

Electromagnetic micromirror array with single-crystal silicon mirror plate and aluminum spring

Chang Hyeon Ji, Yong Kweon Kim

Electronic and Electrical Engineering

Research output: Contribution to journal › Article › peer-review

23 Scopus citations

Abstract

We have designed and fabricated an addressable 4 × 4 array of micromirror capable of providing up to 90° of angular deflection. Each micromirror is comprised of a single-crystalline silicon mirror plate supported by aluminum springs, which provides an extremely flat reflective surface and a compliant spring material that enables the integration of the device into a limited area without mitigating its performance (i.e., total angular deflection). The device is fabricated using a combination of surface and bulk micromachining processes, such as electroplating, bulk wet etching and XeF₂ etch processes. Selective actuation is accomplished by the use of an electrostatic clamping force on each mirror plate. A mirror rotation angle of more than 80° can be obtained by applying an external magnetic field, and this angle can be further increased by the use of an electrostatic force. The designed structure can be used in microphotonic applications.

Original language	English
Pages (from-to)	584-590
Number of pages	7
Journal	Journal of Lightwave Technology
Volume	21
Issue number	3
DOIs	https://doi.org/10.1109/JLT.2003.809549
State	Published - Mar 2003

Keywords

Electromagnetic forces
Micromachining
Nickel
Optical switches
Photonic switching systems
Silicon

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10.1109/JLT.2003.809549

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title = "Electromagnetic micromirror array with single-crystal silicon mirror plate and aluminum spring",

abstract = "We have designed and fabricated an addressable 4 × 4 array of micromirror capable of providing up to 90° of angular deflection. Each micromirror is comprised of a single-crystalline silicon mirror plate supported by aluminum springs, which provides an extremely flat reflective surface and a compliant spring material that enables the integration of the device into a limited area without mitigating its performance (i.e., total angular deflection). The device is fabricated using a combination of surface and bulk micromachining processes, such as electroplating, bulk wet etching and XeF2 etch processes. Selective actuation is accomplished by the use of an electrostatic clamping force on each mirror plate. A mirror rotation angle of more than 80° can be obtained by applying an external magnetic field, and this angle can be further increased by the use of an electrostatic force. The designed structure can be used in microphotonic applications.",

keywords = "Electromagnetic forces, Micromachining, Nickel, Optical switches, Photonic switching systems, Silicon",

author = "Ji, {Chang Hyeon} and Kim, {Yong Kweon}",

note = "Funding Information: Manuscript received March 5, 2002; revised September 30, 2002. This work was supported by the Ministry of Science and Technology and the Ministry of Industry and Energy under Micromachine Technology Development Program and partly supported by the Brain Korea 21 Project.",

year = "2003",

month = mar,

doi = "10.1109/JLT.2003.809549",

language = "English",

volume = "21",

pages = "584--590",

journal = "Journal of Lightwave Technology",

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publisher = "Institute of Electrical and Electronics Engineers Inc.",

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AU - Ji, Chang Hyeon

AU - Kim, Yong Kweon

N1 - Funding Information: Manuscript received March 5, 2002; revised September 30, 2002. This work was supported by the Ministry of Science and Technology and the Ministry of Industry and Energy under Micromachine Technology Development Program and partly supported by the Brain Korea 21 Project.

PY - 2003/3

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N2 - We have designed and fabricated an addressable 4 × 4 array of micromirror capable of providing up to 90° of angular deflection. Each micromirror is comprised of a single-crystalline silicon mirror plate supported by aluminum springs, which provides an extremely flat reflective surface and a compliant spring material that enables the integration of the device into a limited area without mitigating its performance (i.e., total angular deflection). The device is fabricated using a combination of surface and bulk micromachining processes, such as electroplating, bulk wet etching and XeF2 etch processes. Selective actuation is accomplished by the use of an electrostatic clamping force on each mirror plate. A mirror rotation angle of more than 80° can be obtained by applying an external magnetic field, and this angle can be further increased by the use of an electrostatic force. The designed structure can be used in microphotonic applications.

AB - We have designed and fabricated an addressable 4 × 4 array of micromirror capable of providing up to 90° of angular deflection. Each micromirror is comprised of a single-crystalline silicon mirror plate supported by aluminum springs, which provides an extremely flat reflective surface and a compliant spring material that enables the integration of the device into a limited area without mitigating its performance (i.e., total angular deflection). The device is fabricated using a combination of surface and bulk micromachining processes, such as electroplating, bulk wet etching and XeF2 etch processes. Selective actuation is accomplished by the use of an electrostatic clamping force on each mirror plate. A mirror rotation angle of more than 80° can be obtained by applying an external magnetic field, and this angle can be further increased by the use of an electrostatic force. The designed structure can be used in microphotonic applications.

KW - Electromagnetic forces

KW - Micromachining

KW - Nickel

KW - Optical switches

KW - Photonic switching systems

KW - Silicon

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DO - 10.1109/JLT.2003.809549

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JO - Journal of Lightwave Technology

JF - Journal of Lightwave Technology

IS - 3

ER -

Electromagnetic micromirror array with single-crystal silicon mirror plate and aluminum spring

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Keywords

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