Effective modification of Pd surfaces with TiO2 promoters using selective chemical vapor deposition and the effect on catalytic performance improvement

Jo Eun Um; Won Jung Yoon; Hyung Wook Choi; Woo Jae Kim

doi:10.1016/j.jiec.2014.01.018

Effective modification of Pd surfaces with TiO₂ promoters using selective chemical vapor deposition and the effect on catalytic performance improvement

Jo Eun Um
, Won Jung Yoon
, Hyung Wook Choi
, Woo Jae Kim

Department of Chemical Engineering & Materials Science

Research output: Contribution to journal › Article › peer-review

11 Scopus citations

Abstract

In this paper, we describe a novel method for selectively attaching TiO₂ promoters on Pd surfaces in Pd/SiO₂ catalysts using selective chemical vapor deposition (CVD). Ti was selectively deposited on Pd active sites over a SiO₂ support under a hydrogen atmosphere when titanium tetraisopropoxide was used as a Ti precursor. The Pd-Ti/SiO₂ catalyst modified by CVD exhibits approximately 1.8 times higher ethylene selectivity than the un-modified Pd/SiO₂ catalyst in the selective hydrogenation of acetylene due to the effective geometric modification of the Pd surface, which is beneficial to ethylene selectivity, by the selectively deposited Ti species.

Original language	English
Pages (from-to)	4183-4187
Number of pages	5
Journal	Journal of Industrial and Engineering Chemistry
Volume	20
Issue number	6
DOIs	https://doi.org/10.1016/j.jiec.2014.01.018
State	Published - 25 Nov 2014

Bibliographical note

Publisher Copyright:
© 2014 The Korean Society of Industrial and Engineering Chemistry.

Keywords

Acetylene hydrogenation
High ethylene selectivity
Pd catalyst
Selective chemical vapor deposition
TiO promoters

Access to Document

10.1016/j.jiec.2014.01.018

Cite this

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title = "Effective modification of Pd surfaces with TiO2 promoters using selective chemical vapor deposition and the effect on catalytic performance improvement",

abstract = "In this paper, we describe a novel method for selectively attaching TiO2 promoters on Pd surfaces in Pd/SiO2 catalysts using selective chemical vapor deposition (CVD). Ti was selectively deposited on Pd active sites over a SiO2 support under a hydrogen atmosphere when titanium tetraisopropoxide was used as a Ti precursor. The Pd-Ti/SiO2 catalyst modified by CVD exhibits approximately 1.8 times higher ethylene selectivity than the un-modified Pd/SiO2 catalyst in the selective hydrogenation of acetylene due to the effective geometric modification of the Pd surface, which is beneficial to ethylene selectivity, by the selectively deposited Ti species.",

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AU - Um, Jo Eun

AU - Yoon, Won Jung

AU - Choi, Hyung Wook

AU - Kim, Woo Jae

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AB - In this paper, we describe a novel method for selectively attaching TiO2 promoters on Pd surfaces in Pd/SiO2 catalysts using selective chemical vapor deposition (CVD). Ti was selectively deposited on Pd active sites over a SiO2 support under a hydrogen atmosphere when titanium tetraisopropoxide was used as a Ti precursor. The Pd-Ti/SiO2 catalyst modified by CVD exhibits approximately 1.8 times higher ethylene selectivity than the un-modified Pd/SiO2 catalyst in the selective hydrogenation of acetylene due to the effective geometric modification of the Pd surface, which is beneficial to ethylene selectivity, by the selectively deposited Ti species.

KW - Acetylene hydrogenation

KW - High ethylene selectivity

KW - Pd catalyst

KW - Selective chemical vapor deposition

KW - TiO promoters

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