Abstract
In this paper, we describe a novel method for selectively attaching TiO2 promoters on Pd surfaces in Pd/SiO2 catalysts using selective chemical vapor deposition (CVD). Ti was selectively deposited on Pd active sites over a SiO2 support under a hydrogen atmosphere when titanium tetraisopropoxide was used as a Ti precursor. The Pd-Ti/SiO2 catalyst modified by CVD exhibits approximately 1.8 times higher ethylene selectivity than the un-modified Pd/SiO2 catalyst in the selective hydrogenation of acetylene due to the effective geometric modification of the Pd surface, which is beneficial to ethylene selectivity, by the selectively deposited Ti species.
Original language | English |
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Pages (from-to) | 4183-4187 |
Number of pages | 5 |
Journal | Journal of Industrial and Engineering Chemistry |
Volume | 20 |
Issue number | 6 |
DOIs | |
State | Published - 25 Nov 2014 |
Keywords
- Acetylene hydrogenation
- High ethylene selectivity
- Pd catalyst
- Selective chemical vapor deposition
- TiO promoters