Effective modification of Pd surfaces with TiO2 promoters using selective chemical vapor deposition and the effect on catalytic performance improvement

Jo Eun Um, Won Jung Yoon, Hyung Wook Choi, Woo Jae Kim

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Abstract

In this paper, we describe a novel method for selectively attaching TiO2 promoters on Pd surfaces in Pd/SiO2 catalysts using selective chemical vapor deposition (CVD). Ti was selectively deposited on Pd active sites over a SiO2 support under a hydrogen atmosphere when titanium tetraisopropoxide was used as a Ti precursor. The Pd-Ti/SiO2 catalyst modified by CVD exhibits approximately 1.8 times higher ethylene selectivity than the un-modified Pd/SiO2 catalyst in the selective hydrogenation of acetylene due to the effective geometric modification of the Pd surface, which is beneficial to ethylene selectivity, by the selectively deposited Ti species.

Original languageEnglish
Pages (from-to)4183-4187
Number of pages5
JournalJournal of Industrial and Engineering Chemistry
Volume20
Issue number6
DOIs
StatePublished - 25 Nov 2014

Bibliographical note

Publisher Copyright:
© 2014 The Korean Society of Industrial and Engineering Chemistry.

Keywords

  • Acetylene hydrogenation
  • High ethylene selectivity
  • Pd catalyst
  • Selective chemical vapor deposition
  • TiO promoters

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