Dynamics of material removal in ultrashort laser ablation of dielectrics

R. Stoian; D. Ashkenasi; A. Rosenfeld; M. Lorenz; E. E.B. Campbell

doi:10.1109/cleo.2000.907464

Dynamics of material removal in ultrashort laser ablation of dielectrics

R. Stoian, D. Ashkenasi, A. Rosenfeld, M. Lorenz, E. E.B. Campbell

Department of Physics

Research output: Contribution to conference › Paper › peer-review

Abstract

The mechanism and dynamics of ion expulsion are studied using a combination of time of flight mass spectrometry and pump probe techniques. Coulomb explosion is identified as the dominant mechanism for ion emission under low fluence/low number of laser shots irradiation ('gentle' ablation regime) as a direct consequence of the electronic mediated energy transfer to the sample. After sufficient incubation due to the defect accumulation following repetitive irradiation ('strong' ablation regime) the ablation rate increases with almost on order of magnitude, the ionization efficiency decreases and the velocity distribution are shifted to lower values.

Original language	English
Pages	615
Number of pages	1
DOIs	https://doi.org/10.1109/cleo.2000.907464
State	Published - 2000
Event	Conference on Lasers and Electro-Optics (CLEO 2000) - San Francisco, CA, USA Duration: 7 May 2000 → 12 May 2000

Conference

Conference	Conference on Lasers and Electro-Optics (CLEO 2000)
City	San Francisco, CA, USA
Period	7/05/00 → 12/05/00

Access to Document

10.1109/cleo.2000.907464

Cite this

@conference{c7a7f74c50924d879e86c72a29ed4578,

title = "Dynamics of material removal in ultrashort laser ablation of dielectrics",

abstract = "The mechanism and dynamics of ion expulsion are studied using a combination of time of flight mass spectrometry and pump probe techniques. Coulomb explosion is identified as the dominant mechanism for ion emission under low fluence/low number of laser shots irradiation ('gentle' ablation regime) as a direct consequence of the electronic mediated energy transfer to the sample. After sufficient incubation due to the defect accumulation following repetitive irradiation ('strong' ablation regime) the ablation rate increases with almost on order of magnitude, the ionization efficiency decreases and the velocity distribution are shifted to lower values.",

author = "R. Stoian and D. Ashkenasi and A. Rosenfeld and M. Lorenz and Campbell, {E. E.B.}",

year = "2000",

doi = "10.1109/cleo.2000.907464",

language = "English",

pages = "615",

note = "Conference on Lasers and Electro-Optics (CLEO 2000) ; Conference date: 07-05-2000 Through 12-05-2000",

}

TY - CONF

T1 - Dynamics of material removal in ultrashort laser ablation of dielectrics

AU - Stoian, R.

AU - Ashkenasi, D.

AU - Rosenfeld, A.

AU - Lorenz, M.

AU - Campbell, E. E.B.

PY - 2000

Y1 - 2000

N2 - The mechanism and dynamics of ion expulsion are studied using a combination of time of flight mass spectrometry and pump probe techniques. Coulomb explosion is identified as the dominant mechanism for ion emission under low fluence/low number of laser shots irradiation ('gentle' ablation regime) as a direct consequence of the electronic mediated energy transfer to the sample. After sufficient incubation due to the defect accumulation following repetitive irradiation ('strong' ablation regime) the ablation rate increases with almost on order of magnitude, the ionization efficiency decreases and the velocity distribution are shifted to lower values.

AB - The mechanism and dynamics of ion expulsion are studied using a combination of time of flight mass spectrometry and pump probe techniques. Coulomb explosion is identified as the dominant mechanism for ion emission under low fluence/low number of laser shots irradiation ('gentle' ablation regime) as a direct consequence of the electronic mediated energy transfer to the sample. After sufficient incubation due to the defect accumulation following repetitive irradiation ('strong' ablation regime) the ablation rate increases with almost on order of magnitude, the ionization efficiency decreases and the velocity distribution are shifted to lower values.

UR - http://www.scopus.com/inward/record.url?scp=0034543272&partnerID=8YFLogxK

U2 - 10.1109/cleo.2000.907464

DO - 10.1109/cleo.2000.907464

M3 - Paper

AN - SCOPUS:0034543272

SP - 615

T2 - Conference on Lasers and Electro-Optics (CLEO 2000)

Y2 - 7 May 2000 through 12 May 2000

ER -

Dynamics of material removal in ultrashort laser ablation of dielectrics

Abstract

Conference

Access to Document

Fingerprint

Cite this