Dynamics of material removal in ultrashort laser ablation of dielectrics

R. Stoian, D. Ashkenasi, A. Rosenfeld, M. Lorenz, E. E.B. Campbell

Research output: Contribution to conferencePaperpeer-review


The mechanism and dynamics of ion expulsion are studied using a combination of time of flight mass spectrometry and pump probe techniques. Coulomb explosion is identified as the dominant mechanism for ion emission under low fluence/low number of laser shots irradiation ('gentle' ablation regime) as a direct consequence of the electronic mediated energy transfer to the sample. After sufficient incubation due to the defect accumulation following repetitive irradiation ('strong' ablation regime) the ablation rate increases with almost on order of magnitude, the ionization efficiency decreases and the velocity distribution are shifted to lower values.

Original languageEnglish
Number of pages1
StatePublished - 2000
EventConference on Lasers and Electro-Optics (CLEO 2000) - San Francisco, CA, USA
Duration: 7 May 200012 May 2000


ConferenceConference on Lasers and Electro-Optics (CLEO 2000)
CitySan Francisco, CA, USA


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