@article{b548dc8c71004e5bae23870ad03fedd8,
title = "Direct top-down fabrication of nanoscale electrodes for organic semiconductors using fluoropolymer resists",
abstract = "We report the use of a fluoropolymer resist for the damage-free e-beam lithographic patterning of organic semiconductors. The same material is also shown to be suitable as an orthogonal electron beam resist for the patterning of top-contact electrodes on organic thin films. We demonstrate this by characterizing pentacene field-effect transistors with feature sizes as small as 100 nm and compare the performance of bottom- and top-contacted devices.",
author = "Jungho Park and Jonathan Ho and Hoyeol Yun and Myeongjin Park and Lee, {Jung Hyun} and Miri Seo and Campbell, {Eleanor E.B.} and Changhee Lee and Seungmoon Pyo and Lee, {Sang Wook}",
note = "Funding Information: This work was supported through BSR (2011-0021207), WCU (R31-2008-000-10057-0), and framework of international cooperation programs by the National Research Foundation of Korea (NRF) funded by the Ministry of Education, Science and Technology.",
year = "2013",
month = jun,
doi = "10.1007/s00339-012-7411-7",
language = "English",
volume = "111",
pages = "1051--1056",
journal = "Applied Physics A: Materials Science and Processing",
issn = "0947-8396",
number = "4",
}