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Diffusion of the Diboron Pair in Silicon
Gyeong S. Hwang, William A. Goddard
Department of Chemical Engineering & Materials Science
Research output
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Contribution to journal
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Article
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peer-review
14
Scopus citations
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Dive into the research topics of 'Diffusion of the Diboron Pair in Silicon'. Together they form a unique fingerprint.
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Engineering
Dopant Concentration
100%
Generalized Gradient Approximation
100%
Kinetic Model
100%
Activation Energy
100%
Annealing Temperature
100%
Local Minimum
100%
Chemistry
Diboron
100%
Density Functional Theory
33%
Chemical Kinetics Characteristics
33%
Reaction Activation Energy
33%
First Principle
33%
Doping Material
33%
Generalized Gradient Approximation
33%
Material Science
Boron
100%
Density
50%
Annealing
50%
Doping (Additives)
50%
Biochemistry, Genetics and Molecular Biology
Facilitated Diffusion
100%
Kinetics
20%
Chemical Engineering
Chemical Kinetics Characteristics
100%