Chemical vapor deposition of amorphous ruthenium-phosphorus alloy films for Cu interconnect applications

John G. Ekerdt, Jinhong Shin, Hyunwoo Kim, Lucas B. Henderson, Gyeong S. Hwang, Kyriacos Agapiou, Richard A. Jones

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

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Engineering & Materials Science

Chemical Compounds