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Chemical vapor deposition of amorphous ruthenium-phosphorus alloy films for Cu interconnect applications

  • John G. Ekerdt
  • , Jinhong Shin
  • , Hyunwoo Kim
  • , Lucas B. Henderson
  • , Gyeong S. Hwang
  • , Kyriacos Agapiou
  • , Richard A. Jones

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

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