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BAVI-cell: A novel high-speed 50 nm SONOS memory with band-to-band tunneling initiated avalanche injection mechanism

  • Jae Sung Sim
  • , Il Han Park
  • , Seongjae Cho
  • , Tae Hun Kim
  • , Ki Whan Song
  • , Jihye Kong
  • , Hyungcheol Shin
  • , Jong Duk Lee
  • , Byung Gook Park

Research output: Contribution to journalConference articlepeer-review

8 Scopus citations

Abstract

A p-channel SONOS memory, based on band-to-band tunneling initiated avalanche hot-hole injection mechanism, was firstly proposed to solve the F-N erase problem in NAND flash application. The fabricated device with 50-nm gate length effectively suppressed the short channel effect and featured an excellent program and erase performance, where the time scale of a few and ∼100 μsec could be obtained, respectively.

Original languageEnglish
Article number1469237
Pages (from-to)122-123
Number of pages2
JournalDigest of Technical Papers - Symposium on VLSI Technology
Volume2005
DOIs
StatePublished - 2005
Event2005 Symposium on VLSI Technology - Kyoto, Japan
Duration: 14 Jun 200514 Jun 2005

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