Batch fabrication of high-performance planar patch-clamp devices in quartz

James R. Heath, John M. Nagarah, Eunsu Paek, Yi Luo, Pin Wang, Gyeong S. Hwang

Research output: Contribution to journalArticlepeer-review

16 Scopus citations


The success of the patch-clamp technique has driven an effort to create wafer-based patch-clamp platforms. We develop a lithographic/electrochemical processing scheme that generates ultrasmooth, high aspect ratio pores in quartz. These devices achieve gigaohm seals in nearly 80% of trials, with the majority exhibiting seal resistances from 20-80 G, competing with pipette-based patch-clamp measurements.

Original languageEnglish
Pages (from-to)4622-4627
Number of pages6
JournalAdvanced Materials
Issue number41
StatePublished - 2 Nov 2010


  • Gigaohm seals
  • High aspect ratio pore
  • Metal masks
  • Planar patch-clamp
  • Reactive ion etching


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