Band offset FinFET-based URAM (unified-RAM) built on SiC for multi-functioning NVM and capacitorless 1T-DRAM

  • Jin Woo Han
  • , Seong Wan Ryu
  • , Sungho Kim
  • , Chung Jin Kim
  • , Jae Hyuk Ahn
  • , Sung Jin Choi
  • , Jin Choi Kyu
  • , Jin Cho Byung
  • , Soo Kim Jin
  • , Hee Kim Kwang
  • , Sung Lee Gi
  • , Sub Oh Jae
  • , Ho Song Myong
  • , Chang Park Yun
  • , Woo Kim Jeoung
  • , Yang Kyu Choi

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

14 Scopus citations

Abstract

A FinFET-based unified-RAM (URAM) using the band offset of Si/SiC is demonstrated for the fusion of a non-volatile memory (NVM) and capacitorless 1T-DRAM operation. An oxide/nitride/oxide (O/N/O) gate dielectric and a floating body caused by the band offset are combined in a bulk FinFET to allow two memory operations in a single transistor. The device is fabricated on an epitaxially grown Si/SiC substrate and its process is fully compatible with a conventional bulk FinFET SONOS. Highly reliable NVM and high speed 1T-DRAM operation are confirmed in a single URAM cell.

Original languageEnglish
Title of host publication2008 Symposium on VLSI Technology Digest of Technical Papers, VLSIT
Pages200-201
Number of pages2
DOIs
StatePublished - 2008
Event2008 Symposium on VLSI Technology Digest of Technical Papers, VLSIT - Honolulu, HI, United States
Duration: 17 Jun 200819 Jun 2008

Publication series

NameDigest of Technical Papers - Symposium on VLSI Technology
ISSN (Print)0743-1562

Conference

Conference2008 Symposium on VLSI Technology Digest of Technical Papers, VLSIT
Country/TerritoryUnited States
CityHonolulu, HI
Period17/06/0819/06/08

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