Band offset FinFET-based URAM (unified-RAM) built on SiC for multi-functioning NVM and capacitorless 1T-DRAM

Jin Woo Han, Seong Wan Ryu, Sungho Kim, Chung Jin Kim, Jae Hyuk Ahn, Sung Jin Choi, Jin Choi Kyu, Jin Cho Byung, Soo Kim Jin, Hee Kim Kwang, Sung Lee Gi, Sub Oh Jae, Ho Song Myong, Chang Park Yun, Woo Kim Jeoung, Yang Kyu Choi

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

14 Scopus citations

Abstract

A FinFET-based unified-RAM (URAM) using the band offset of Si/SiC is demonstrated for the fusion of a non-volatile memory (NVM) and capacitorless 1T-DRAM operation. An oxide/nitride/oxide (O/N/O) gate dielectric and a floating body caused by the band offset are combined in a bulk FinFET to allow two memory operations in a single transistor. The device is fabricated on an epitaxially grown Si/SiC substrate and its process is fully compatible with a conventional bulk FinFET SONOS. Highly reliable NVM and high speed 1T-DRAM operation are confirmed in a single URAM cell.

Original languageEnglish
Title of host publication2008 Symposium on VLSI Technology Digest of Technical Papers, VLSIT
Pages200-201
Number of pages2
DOIs
StatePublished - 2008
Event2008 Symposium on VLSI Technology Digest of Technical Papers, VLSIT - Honolulu, HI, United States
Duration: 17 Jun 200819 Jun 2008

Publication series

NameDigest of Technical Papers - Symposium on VLSI Technology
ISSN (Print)0743-1562

Conference

Conference2008 Symposium on VLSI Technology Digest of Technical Papers, VLSIT
Country/TerritoryUnited States
CityHonolulu, HI
Period17/06/0819/06/08

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