Application of a new Cl-plasma-treated Ag/AgCl reference electrode to micromachined glucose sensor

Se Ik Park; Sang Beom Jun; Sejin Park; Hee Chan Kim; Sung June Kim

doi:10.1109/JSEN.2003.814649

Application of a new Cl-plasma-treated Ag/AgCl reference electrode to micromachined glucose sensor

Se Ik Park, Sang Beom Jun, Sejin Park, Hee Chan Kim, Sung June Kim

Electronic and Electrical Engineering

Research output: Contribution to journal › Article › peer-review

31 Scopus citations

Abstract

Micromachined glucose sensors were fabricated and integrated with the plasma-treated Ag/AgCl reference electrodes for the first time. The surface of the Cl-plasma exposed AgCl layers was of granule-shaped morphology and showed the favorable long-term stability with a 13-mV potential drift after 5 h over a commercial liquid-junction Ag/AgCl reference electrode in phosphate buffered saline. The fabricated devices showed a typical behavior of an amperometric glucose sensor and a successful operation as a three-electrode system. Due to the integrability of the reference electrode and the use of low-temperature steps only, the new micromachined process can allow easy mass production of the device and the monolithic integration of signal processing circuitry in the future.

Original language	English
Pages (from-to)	267-273
Number of pages	7
Journal	IEEE Sensors Journal
Volume	3
Issue number	3
DOIs	https://doi.org/10.1109/JSEN.2003.814649
State	Published - Jun 2003

Bibliographical note

Funding Information:
Manuscript received March 15, 2002; revised December 4, 2002. This work was supported by the Nano Bioelectronics and Systems Research Center (NBS-ERC), Korean Science of Engineering Foundation, Korea. The associate editor coordinating the review of this paper and approving it for publication was Dr. Michael V. Pishko.

Keywords

Mass production
Micromachined glucose sensor
Monolithic integration
Plasma-treated Ag/AgCl reference electrode
Potential drift

Access to Document

10.1109/JSEN.2003.814649

Cite this

@article{9161c8e8ec3a4083b464daca13f0e0fa,

title = "Application of a new Cl-plasma-treated Ag/AgCl reference electrode to micromachined glucose sensor",

abstract = "Micromachined glucose sensors were fabricated and integrated with the plasma-treated Ag/AgCl reference electrodes for the first time. The surface of the Cl-plasma exposed AgCl layers was of granule-shaped morphology and showed the favorable long-term stability with a 13-mV potential drift after 5 h over a commercial liquid-junction Ag/AgCl reference electrode in phosphate buffered saline. The fabricated devices showed a typical behavior of an amperometric glucose sensor and a successful operation as a three-electrode system. Due to the integrability of the reference electrode and the use of low-temperature steps only, the new micromachined process can allow easy mass production of the device and the monolithic integration of signal processing circuitry in the future.",

keywords = "Mass production, Micromachined glucose sensor, Monolithic integration, Plasma-treated Ag/AgCl reference electrode, Potential drift",

author = "Park, {Se Ik} and Jun, {Sang Beom} and Sejin Park and Kim, {Hee Chan} and Kim, {Sung June}",

note = "Funding Information: Manuscript received March 15, 2002; revised December 4, 2002. This work was supported by the Nano Bioelectronics and Systems Research Center (NBS-ERC), Korean Science of Engineering Foundation, Korea. The associate editor coordinating the review of this paper and approving it for publication was Dr. Michael V. Pishko.",

year = "2003",

month = jun,

doi = "10.1109/JSEN.2003.814649",

language = "English",

volume = "3",

pages = "267--273",

journal = "IEEE Sensors Journal",

issn = "1530-437X",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

number = "3",

}

TY - JOUR

T1 - Application of a new Cl-plasma-treated Ag/AgCl reference electrode to micromachined glucose sensor

AU - Park, Se Ik

AU - Jun, Sang Beom

AU - Park, Sejin

AU - Kim, Hee Chan

AU - Kim, Sung June

N1 - Funding Information: Manuscript received March 15, 2002; revised December 4, 2002. This work was supported by the Nano Bioelectronics and Systems Research Center (NBS-ERC), Korean Science of Engineering Foundation, Korea. The associate editor coordinating the review of this paper and approving it for publication was Dr. Michael V. Pishko.

PY - 2003/6

Y1 - 2003/6

N2 - Micromachined glucose sensors were fabricated and integrated with the plasma-treated Ag/AgCl reference electrodes for the first time. The surface of the Cl-plasma exposed AgCl layers was of granule-shaped morphology and showed the favorable long-term stability with a 13-mV potential drift after 5 h over a commercial liquid-junction Ag/AgCl reference electrode in phosphate buffered saline. The fabricated devices showed a typical behavior of an amperometric glucose sensor and a successful operation as a three-electrode system. Due to the integrability of the reference electrode and the use of low-temperature steps only, the new micromachined process can allow easy mass production of the device and the monolithic integration of signal processing circuitry in the future.

AB - Micromachined glucose sensors were fabricated and integrated with the plasma-treated Ag/AgCl reference electrodes for the first time. The surface of the Cl-plasma exposed AgCl layers was of granule-shaped morphology and showed the favorable long-term stability with a 13-mV potential drift after 5 h over a commercial liquid-junction Ag/AgCl reference electrode in phosphate buffered saline. The fabricated devices showed a typical behavior of an amperometric glucose sensor and a successful operation as a three-electrode system. Due to the integrability of the reference electrode and the use of low-temperature steps only, the new micromachined process can allow easy mass production of the device and the monolithic integration of signal processing circuitry in the future.

KW - Mass production

KW - Micromachined glucose sensor

KW - Monolithic integration

KW - Plasma-treated Ag/AgCl reference electrode

KW - Potential drift

UR - http://www.scopus.com/inward/record.url?scp=3042739491&partnerID=8YFLogxK

U2 - 10.1109/JSEN.2003.814649

DO - 10.1109/JSEN.2003.814649

M3 - Article

AN - SCOPUS:3042739491

SN - 1530-437X

VL - 3

SP - 267

EP - 273

JO - IEEE Sensors Journal

JF - IEEE Sensors Journal

IS - 3

ER -

Application of a new Cl-plasma-treated Ag/AgCl reference electrode to micromachined glucose sensor

Abstract

Bibliographical note

Keywords

Access to Document

Fingerprint

Cite this