An unconventional route to hierarchically ordered block copolymers on a gradient patterned surface through controlled evaporative self-assembly

Myunghwan Byun, Wei Han, Bo Li, Xukai Xin, Zhiqun Lin

Research output: Contribution to journalArticlepeer-review

57 Scopus citations

Abstract

A chemically patterned surface was formed by controlled evaporative self-assembly of concentric polymer stripes, followed by the removal of weakly deposited polymer, giving ultrathin polymer stripes with a width gradient on the Si substrate (see picture). A thin film of diblock copolymer hierarchically self-assembled on the ultrathin polymer stripes, giving arrays of nanocylinders perpendicular to the surface of the film.

Original languageEnglish
Pages (from-to)1122-1127
Number of pages6
JournalAngewandte Chemie - International Edition
Volume52
Issue number4
DOIs
StatePublished - 21 Jan 2013

Keywords

  • block copolymers
  • controlled evaporative self-assembly
  • hierarchically ordered structures
  • surface patterning

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