Abstract
A chemically patterned surface was formed by controlled evaporative self-assembly of concentric polymer stripes, followed by the removal of weakly deposited polymer, giving ultrathin polymer stripes with a width gradient on the Si substrate (see picture). A thin film of diblock copolymer hierarchically self-assembled on the ultrathin polymer stripes, giving arrays of nanocylinders perpendicular to the surface of the film.
Original language | English |
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Pages (from-to) | 1122-1127 |
Number of pages | 6 |
Journal | Angewandte Chemie - International Edition |
Volume | 52 |
Issue number | 4 |
DOIs | |
State | Published - 21 Jan 2013 |
Keywords
- block copolymers
- controlled evaporative self-assembly
- hierarchically ordered structures
- surface patterning