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An experimental and simulation study of arsenic diffusion behavior in point defect engineered silicon

  • Ning Kong
  • , Taras A. Kirichenko
  • , Gyeong S. Hwang
  • , Foisy C. Mark
  • , Steven G.H. Anderson
  • , Sanjay K. Banerjee

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

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