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Ablation of graphene film by direct Nd:YVO
4
laser under various beaming conditions
Jeongmin Lee
, Jae Hee Han
, Jung Hun Lee
, Ji Beom Yoo
,
Seongjae Cho
, Sang Jik Kwon
, Eou Sik Cho
Electronic and Electrical Engineering
Research output
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Contribution to journal
›
Article
›
peer-review
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4
laser under various beaming conditions'. Together they form a unique fingerprint.
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Material Science
Graphene
100%
Film
100%
Lithography
25%
Carrier Mobility
12%
Monolayers
12%
Optical Device
12%
Functional Material
12%
Vanadate
12%
Plasma Etching
12%
Yttrium
12%
Laser Diode
12%
Neodymium
12%
Glass Substrate
12%
Engineering
Graphene
100%
Scanning Speed
25%
Q Factor
12%
Process Unit
12%
Patterning Technique
12%
Processing Technique
12%
Optical Lithography
12%
Process Condition
12%
Electron Optical Lithography
12%
Optical Transparency
12%
Repetition Rate
12%
Optical Microscope
12%
Realization
12%
Laser Patterning
12%
Monolayers
12%
Glass Substrate
12%
Raman Spectra
12%
Carrier Mobility
12%