A route to nanoscopic SiO2 posts via block copolymer templates

Ho Cheol Kim; Xinqiao Jia; Christopher M. Stafford; Dong Ha Kim; Thomas J. McCarthy; Mark Tuominen; Craig J. Hawker; Thomas P. Russell

doi:10.1002/1521-4095(200106)13:11<795::AID-ADMA795>3.0.CO;2-1

A route to nanoscopic SiO₂ posts via block copolymer templates

Ho Cheol Kim
, Xinqiao Jia
, Christopher M. Stafford
, Dong Ha Kim
, Thomas J. McCarthy
, Mark Tuominen
, Craig J. Hawker
, Thomas P. Russell

Department of Chemistry & Nanoscience

Research output: Contribution to journal › Article › peer-review

191 Scopus citations

Original language	English
Pages (from-to)	795-797
Number of pages	3
Journal	Advanced Materials
Volume	13
Issue number	11
DOIs	https://doi.org/10.1002/1521-4095(200106)13:11<795::AID-ADMA795>3.0.CO;2-1
State	Published - 5 Jun 2001

Access to Document

10.1002/1521-4095(200106)13:11<795::AID-ADMA795>3.0.CO;2-1

Cite this

@article{b31e54ad73db4954bc093f873a8bf8e4,

title = "A route to nanoscopic SiO2 posts via block copolymer templates",

author = "Kim, \{Ho Cheol\} and Xinqiao Jia and Stafford, \{Christopher M.\} and Kim, \{Dong Ha\} and McCarthy, \{Thomas J.\} and Mark Tuominen and Hawker, \{Craig J.\} and Russell, \{Thomas P.\}",

year = "2001",

month = jun,

day = "5",

doi = "10.1002/1521-4095(200106)13:11<795::AID-ADMA795>3.0.CO;2-1",

language = "English",

volume = "13",

pages = "795--797",

journal = "Advanced Materials",

issn = "0935-9648",

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TY - JOUR

T1 - A route to nanoscopic SiO2 posts via block copolymer templates

AU - Kim, Ho Cheol

AU - Jia, Xinqiao

AU - Stafford, Christopher M.

AU - Kim, Dong Ha

AU - McCarthy, Thomas J.

AU - Tuominen, Mark

AU - Hawker, Craig J.

AU - Russell, Thomas P.

PY - 2001/6/5

Y1 - 2001/6/5

UR - https://www.scopus.com/pages/publications/0035810967

U2 - 10.1002/1521-4095(200106)13:11<795::AID-ADMA795>3.0.CO;2-1

DO - 10.1002/1521-4095(200106)13:11<795::AID-ADMA795>3.0.CO;2-1

M3 - Article

AN - SCOPUS:0035810967

SN - 0935-9648

VL - 13

SP - 795

EP - 797

JO - Advanced Materials

JF - Advanced Materials

IS - 11

ER -