Abstract
A cryptographic transistor called a cryptosistor, based on CMOS technology, is demonstrated as a true random number generator (tRNG). It exploits stochastic carrier trapping and detrapping at a deliberately destabilized interface between the gate oxide and silicon channel. Three entropy sources contribute to randomness: impact ionization-generated carriers, jittered out-diffusion carriers, and carriers affected by trapping/detrapping. To enhance carrier variation, a low-quality tetraethyl orthosilicate (TEOS) oxide deposited by chemical vapor deposition is used as the gate dielectric instead of conventional high-quality thermal oxide. Although TEOS is typically used as a stable interlayer dielectric, here a thin TEOS layer with unstable interface properties is intentionally employed to introduce randomness. This approach highlights the use of TEOS as a functional material, aiming to preserve the long-established advantages of CMOS technology, rather than pursuing entirely different materials. The cryptosistor’s irregular voltage output is digitized by a compact, low-power ADC, and the resulting bits pass the NIST SP 800-22 randomness test. As a standard transistor component, the cryptosistor can be easily integrated into chips without additional fabrication steps, offering enhanced security for device-to-chip, chip-to-chip, and chip-to-system communication in hyper-connected environments.
| Original language | English |
|---|---|
| Pages (from-to) | 64942-64955 |
| Number of pages | 14 |
| Journal | ACS Applied Materials and Interfaces |
| Volume | 17 |
| Issue number | 47 |
| DOIs | |
| State | Published - 26 Nov 2025 |
Bibliographical note
Publisher Copyright:© 2025 American Chemical Society
Keywords
- CMOS
- cryptographic
- interface trap
- stochasticity
- tetraethyl orthosilicate
- trap
- true random number generator
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